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Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Thermal evaporation of Cr in Thermal evaporator: Difference between revisions

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== '''Thermal evaporation of Chromium''' ==
== '''Thermal evaporation of Chromium''' ==


Chromium can be thermally evaporated in the [[Specific_Process_Knowledge/Thin_film_deposition/thermalevaporator|Thermal Evaporator]] (NANO 36 THERMAL EVAPORATOR SYSTEM). At DTU Nanolab, we use dedicated 4" long chrome plated tungsten rods (supplier: KJLC). During power ramp up, the material warms up and sublimates. Unlike deposition of Al and Ag, where simple crucibles are used with point-source evaporation from bottom to the substrate, the Deposition of chromium proceeds in all directions. To prevent the deposition on the side-walls and the bottom of the chamber a specific protecting shield is mounted beneath the tungsten rod.
Chromium can be thermally evaporated in the [[Specific_Process_Knowledge/Thin_film_deposition/thermalevaporator|Thermal Evaporator]] (NANO 36 THERMAL EVAPORATOR SYSTEM). At DTU Nanolab, we use dedicated 4" long chromium plated tungsten rods (supplier: KJLC). During power ramp up, the material warms up and sublimates. Unlike deposition of Al and Ag, where simple crucibles are used with point-source evaporation from bottom to the substrate, the deposition of chromium proceeds in all directions. To prevent the deposition on the side-walls and the bottom of the chamber a specific protecting shield is mounted beneath the tungsten rod.
 
The shield design was developed by Henrik Nielsen (Nanolab, ThinFilm), and build by Nanolab Facility service. The process was developed and tested by Evgeniy Shkondin (Nanolab, ThinFilm) in december 2020.


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