Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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* [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Cretch | Cr etch ]] | * [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Cretch | Cr etch ]] | ||
* [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ | * [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Nanoscale silicon etching with SF6 and O2| The CORE process that has now been renamed to ORE t1 ]] | ||
* [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/polySietchhardmask | A polySi etch hard mask ]] | * [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/polySietchhardmask | A polySi etch hard mask ]] | ||