Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*200 mm wafers | *200 mm wafers (less good temperature uniformity than smaller wafers/samples) | ||
*150 mm wafers | *150 mm wafers | ||
*100 mm wafers (always placed on a susceptor or dummy wafer) | *100 mm wafers (always placed on a susceptor or dummy wafer) | ||