Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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|ItemComment= The absence of carbon containing etch gasses ensures that the process chamber is kept clean. | |ItemComment= The absence of carbon containing etch gasses ensures that the process chamber is kept clean. | ||
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|ItemName= Approved recipes | |||
|ItemConfiguration= Running long oxygen cleans is not necessary and must be avoided. Neither are shorter cleans between wafers. | |||
|ItemComment= The absence of carbon containing etch gasses ensures that the process chamber is kept clean. | |||
}} | |||
|} | |} | ||