Specific Process Knowledge/Thin film deposition: Difference between revisions
→Choose material to deposit: made a new page on sputtering of oxides and other compounds |
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[[/Deposition of Alumina|Aluminium Oxide (Al<sub>2</sub>O<sub>3</sub>)]]<br/> | [[/Deposition of Alumina|Aluminium Oxide (Al<sub>2</sub>O<sub>3</sub>)]]<br/> | ||
[[/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Process information|Barium titanate (BaTiO<sub>3</sub>)]]<br/> | [[/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Process information|Barium titanate (BaTiO<sub>3</sub>)]]<br/> | ||
[[/ | [[/Sputter deposition of oxides and other compounds|Chromium Oxide (Cr<sub>2</sub>O<sub>3</sub>)]]<br/> | ||
[[/Deposition of Hafnium Oxide|Hafnium Oxide (HfO<sub>2</sub>)]]<br/> | [[/Deposition of Hafnium Oxide|Hafnium Oxide (HfO<sub>2</sub>)]]<br/> | ||
[[/Deposition of Silicon Oxide|Silicon Oxide (SiO<sub>2</sub>)]]<br/> | [[/Deposition of Silicon Oxide|Silicon Oxide (SiO<sub>2</sub>)]]<br/> | ||
[[/Deposition of Titanium Oxide|Titanium Oxide (TiO<sub>2</sub>)]]<br/> | [[/Deposition of Titanium Oxide|Titanium Oxide (TiO<sub>2</sub>)]]<br/> | ||
[[/ | [[/Sputter deposition of oxides and other compounds|Tantalum Oxide (Ta<sub>2</sub>O<sub>5</sub>)]]<br/> | ||
[[/Deposition of ZnO|Zinc Oxide (ZnO)]]<br/> | [[/Deposition of ZnO|Zinc Oxide (ZnO)]]<br/> | ||
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And an electroceramic: | And an electroceramic: | ||
[[/Sputter deposition of | [[/Sputter deposition of oxides and other compounds|YSZ]] (Yttrium stabilized zirconia)<br/> | ||
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