Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions

← Older editNewer edit →
VisualWikitext
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Line 20: Line 20:


*[[/Al Ebeam evaporation in Temescal |E-beam evaporation of Al in Temescal]]
*[[/Al Ebeam evaporation in Temescal |E-beam evaporation of Al in Temescal]]
*[[/Notes on low oxygen content in e-beam prepared Al thin films|Notes on low oxygen content in e-beam prepared Al thin films (Temescal)]]


<!---->
<!---->
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Aluminium"