Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/AFM Icon Acceptance: Difference between revisions
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*Step height: 1525 nm | *Step height: 1525 nm | ||
[[File:SiO2-resist step Tapping mode with RFESP-75.JPG|400px]] | [[File:SiO2-resist step Tapping mode with RFESP-75.JPG|400px]] | ||
===High Aspect ratio sample=== | |||
High aspect ratio samples (e.g. 100 nm wide trenches 300 nm deep and 2 µm wide trenches 6µm deep). The probes for this: FIB6-400A. | |||
This was done and work spaces were created but no images was saved. | |||