Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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[[Category: Etch (Dry) Equipment|DRIE]] | [[Category: Etch (Dry) Equipment|DRIE]] | ||
===This system is a research tool and not available to the users | ===This system is a research tool and not available to the users | ||
If you want to get access to the tool, then take to professor Henry Jansen | If you want to get access to the tool, then take to professor Henry Jansen=== | ||
* [[Specific Process Knowledge/Etch/DRIE-Pegasus/Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>|Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | * [[Specific Process Knowledge/Etch/DRIE-Pegasus/Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>|Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | ||
*[[/Si Nano Etching|Black silicon on Demand]] | *[[/Si Nano Etching|Black silicon on Demand]] | ||
Revision as of 11:22, 11 May 2020
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===This system is a research tool and not available to the users If you want to get access to the tool, then take to professor Henry Jansen===
- [[Specific Process Knowledge/Etch/DRIE-Pegasus/Nanoscale silicon etching with SF6 and O2|Nanoscale silicon etching with SF6 and O2]]
- Black silicon on Demand