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Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions

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Sputtering of Aluminium: corrected reference to cluster sputter system
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==Sputtering of Aluminium==
==Sputtering of Aluminium==


Aluminium may be sputter deposited in either the Wordentec, the [[Specific Process Knowledge/Thin film deposition/Lesker|Sputter-system (Lesker)]] or the [[Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system|Cluster-based sputter system]].
Aluminium may be sputter deposited in either the Wordentec, the sputter-system (Lesker), or the cluster-based sputter system ("Sputter-System Metal-Oxide(PC1)" and "Sputter-System Metal-Nitride(PC3)"). See more in the matrix below.


*[[/Sputter rates for Al|Sputtering of Aluminium in the Wordentec]]
*[[/Sputter rates for Al|Sputtering of Aluminium in the Wordentec]]