Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
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|[[image:Nikon SMZ 1000.jpg|100x100px|thumb|center]] | |[[image:Nikon SMZ 1000.jpg|100x100px|thumb|center]] | ||
|[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]] | |[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]] | ||
|[[image: | |[[image:LeicaINM100.jpg|100x100px|thumb|center]] | ||
|[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]] | |[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]] | ||
|[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]] | |[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]] |
Revision as of 15:14, 3 April 2020
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Nikon SMZ 1000 | Noco IR | Leica INM 100 | Nikon Eclipse L200 #2 | Zeiss Jenatech | Nikon Eclipse L200 #1 | Leitz Medilux | Nikon Eclipse L200N #3 | Nikon Eclipse L200N #4 | Nikon ME 600 | Leica S8 APO | Zeiss Axiotron | |
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Location | 346-901 | 346-901 | 346-901 | C1 | C1 | D3 | D3 | E4 | E5 | F1 | F2 | F3 |
Responsible group | Wet chemistry | Wet chemistry | Wet chemistry | Thin Film | Thin Film | Thin Film | Thin Film | Lithography | Lithography | Thin Film | Thin Film | Lithography |
Objectives | Zoom 0.8x - 8x |
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Zoom 1x - 8x |
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Ocular | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x |
Special features | Stereoscopic microscope | IR imaging |
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Contrast mechanisms |
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Illumination modes |
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Camera | None | IR camera | DS-Fi2 | DS-Fi1 | None | DS-Fi1 | DX40-274FW |
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DS-Fi2 | None | Infinity X |
Analysis software | None | None | NIS-D | NIS-D | None | NIS-BR | Kappa Control Center | NIS-D | NIS-D | NIS-D | None | DeltaPix |