Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
Appearance
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!Location | |||
|346-901 | |346-901 | ||
|346-901 | |346-901 | ||
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!Responsible group | |||
|Wet chemistry | |Wet chemistry | ||
|Wet chemistry | |Wet chemistry | ||
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!Objectives | |||
|Zoom 0.8x - 8x | |Zoom 0.8x - 8x | ||
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!Ocular | |||
|10x | |10x | ||
|10x | |10x | ||
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!Special features | |||
|Stereoscopic microscope | |Stereoscopic microscope | ||
|IR imaging | |IR imaging | ||
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!Features | |||
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*Episcopic | *Episcopic | ||
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!Camera | |||
|None | |None | ||
|IR camera | |IR camera | ||
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!Analysis software | |||
|None | |None | ||
|None | |None | ||
Revision as of 15:04, 3 April 2020
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It is possible to make an automated scanning of a full wafer on the Nikon Eclipse L200 with motorized stage Nikon Eclipse L200 auto scan guide
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| Microscope | Location | Responsible Group | Objectives | Ocular | Special features | Features | Camera | Analysis software |
|---|---|---|---|---|---|---|---|---|
| Nikon SMZ 1000 |
346-901 | Wet chemistry | Zoom 0.8x - 8x | 10x | Stereoscopic microscope | Episcopic | No | No |
| Noco IR |
346-901 | Wet chemistry |
|
10x | IR imaging |
|
IR camera | No |
| Leica INM100 |
346-901 | Wet chemistry |
|
10x |
|
DS-Fi2 | NIS-D | |
| Nikon Eclipse L200 #2 |
C1 | Thin Film |
|
10x |
|
DS-Fi1 | NIS-D | |
| Zeiss Jenatech |
C1 | Thin Film |
|
10x |
|
No | No | |
| Nikon Eclipse L200 #1 |
D3 | Thin Film |
|
10x |
|
|
DS-Fi1 | NIS-BR |
| Leitz Medilux |
D3 | Thin Film |
|
10x |
|
DX40-274FW | Kappa Control Center | |
| Nikon Eclipse L200N #3 |
E4 | Lithography |
|
10x |
|
|
NIS-D | |
| Nikon Eclipse L200N #4 |
E5 | Lithography |
|
10x |
|
|
NIS-D | |
| Nikon ME 600 |
F1 | Thin Film |
|
10x |
|
DS-Fi2 | NIS-D | |
| Leica S8 APO |
F2 | Thin Film | Zoom 1x - 8x | 10x | Stereoscopic microscope | Episcopic | No | No |
| Zeiss Axiotron |
F3 | Lithography |
|
10x |
|
Infinity X | DeltaPix |
THIS PAGE IS UNDER CONSTRUCTION
| Nikon SMZ 1000 | Noco IR | Leica INM 100 | Nikon Eclipse L200 #2 | Zeiss Jenatech | Nikon Eclipse L200 #1 | Leitz Medilux | Nikon Eclipse L200N #3 | Nikon Eclipse L200N #4 | Nikon ME 600 | Leica S8 APO | Zeiss Axiotron | |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Location | 346-901 | 346-901 | 346-901 | C1 | C1 | D3 | D3 | E4 | E5 | F1 | F2 | F3 |
| Responsible group | Wet chemistry | Wet chemistry | Wet chemistry | Thin Film | Thin Film | Thin Film | Thin Film | Lithography | Lithography | Thin Film | Thin Film | Lithography |
| Objectives | Zoom 0.8x - 8x |
|
|
|
|
|
|
|
|
|
Zoom 1x - 8x |
|
| Ocular | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x |
| Special features | Stereoscopic microscope | IR imaging |
|
Stereoscopic microscope | ||||||||
| Features |
|
|
|
|
|
|
|
|
|
|
|
|
| Camera | None | IR camera | DS-Fi2 | DS-Fi1 | None | DS-Fi1 | DX40-274FW |
|
|
DS-Fi2 | None | Infinity X |
| Analysis software | None | None | NIS-D | NIS-D | None | NIS-BR | Kappa Control Center | NIS-D | NIS-D | NIS-D | None | DeltaPix |



















