Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
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*'''[[Specific_Process_Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide|Auto scan guide]]''' | |||
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*Episcopic | *Episcopic | ||
Revision as of 14:07, 3 April 2020
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| Zeiss Jenatech (strain) | Nikon SMZ 1500 | Leica S8 APO | Leitz Medilux | Zeiss Axiotron 2 | Zeiss Jenatech (particles measurements) | Noco IR microscope | Nikon SMZ 1000 | Nikon ME 600 | Nikon Eclipse L200 | Nikon Eclipse L200 (2) | Nikon ECLIPSE L200N 3 | Nikon ECLIPSE L200N 4 | |
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| Location | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager |
| Special features | Wollastron prism | Stereoscopic microscope | Stereoscopic microscope | No | No | No | Infra red (IR) camera | Stereoscopic microscope | Wollastron prism | Motorized stage | No | No | No |
| Ocular magnification | 10x | No | No | 10x | 10x | 10x | 10x | No | 10x | 10x | 10x | 10x | 10x |
| Objective magnification | 2.5x, 5x, 10x, 20x, 50x | Zoom 100x | Zoom 80x | 2.5x, 5x, 10x, 20x, 50x | 5x, 10x, 20x, 50x | 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 20x, 50x | Zoom 100x | 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 10x, 20x, 50x, 100x |
| Bright field | Yes | No | No | Yes | Yes | Yes | Yes | No | Yes | Yes | Yes | Yes | Yes |
| Dark field | Yes | No | No | No | Yes | Yes | No | No | Yes | Yes | Yes | Yes | Yes |
| Polarizer | Yes | No | No | No | No | Yes | No | No | Yes | No | No | No | No |
| Episcopic light (reflected light) | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes |
| Diascopic light (transmitted light) | No | Yes | No | Yes | Yes | No | Yes | No | No | Yes | Yes | Yes | Yes |
| View with eye | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes |
| View on screen (camera) | Yes | No | No | Yes | Yes | No | Yes (IR) | No | Yes | Yes | Yes | Yes | Yes |
| Measurement option | No | No | No | No | Yes | No | No | No | No | Yes | Yes | Yes | Yes |
It is possible to make an automated scanning of a full wafer on the Nikon Eclipse L200 with motorized stage Nikon Eclipse L200 auto scan guide
THIS PAGE IS UNDER CONSTRUCTION
| Microscope | Location | Responsible Group | Objectives | Ocular | Special features | Features | Camera | Analysis software |
|---|---|---|---|---|---|---|---|---|
| Nikon SMZ 1000 |
346-901 | Wet chemistry | Zoom 0.8x - 8x | 10x | Stereoscopic microscope | Episcopic | No | No |
| Noco IR |
346-901 | Wet chemistry |
|
10x | IR imaging |
|
IR camera | No |
| Leica INM100 |
346-901 | Wet chemistry |
|
10x |
|
DS-Fi2 | NIS-D | |
| Nikon Eclipse L200 #2 |
C1 | Thin Film |
|
10x |
|
DS-Fi1 | NIS-D | |
| Zeiss Jenatech |
C1 | Thin Film |
|
10x |
|
No | No | |
| Nikon Eclipse L200 #1 |
D3 | Thin Film |
|
10x |
|
|
DS-Fi1 | NIS-BR |
| Leitz Medilux |
D3 | Thin Film |
|
10x |
|
DX40-274FW | Kappa Control Center | |
| Nikon Eclipse L200N #3 |
E4 | Lithography |
|
10x |
|
|
NIS-D | |
| Nikon Eclipse L200N #4 |
E5 | Lithography |
|
10x |
|
|
NIS-D | |
| Nikon ME 600 |
F1 | Thin Film |
|
10x |
|
DS-Fi2 | NIS-D | |
| Leica S8 APO |
F2 | Thin Film | Zoom 1x - 8x | 10x | Stereoscopic microscope | Episcopic | No | No |
| Zeiss Axiotron |
F3 | Lithography |
|
10x |
|
Infinity X | DeltaPix |