Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

Jmli (talk | contribs)
Jmli (talk | contribs)
Line 36: Line 36:
## [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/System-description#RF_matching_in_general | RF matching in general ]]
## [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/System-description#RF_matching_in_general | RF matching in general ]]
## [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/System-description#Why_RF_matching_is_extremely_important_in_the_Bosch_process | Why RF matching is extremely important in the Bosch process ]]
## [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/System-description#Why_RF_matching_is_extremely_important_in_the_Bosch_process | Why RF matching is extremely important in the Bosch process ]]
 
# [[Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope|Picoscope process monitoring]]
for more fundamental information of the system. As of 2017, completing the [[LabAdviser/Courses/TPT_Dry_Etch| Dry Etch TPT course]] is mandatory for all new users.  
As of 2017, completing the [[LabAdviser/Courses/TPT_Dry_Etch| Dry Etch TPT course]] is mandatory for all new users.  


On the TPT web page you will find a version of the latest lecture slides - here you will find information as well.
On the TPT web page you will find a version of the latest lecture slides - here you will find information as well.