LabAdviser/314/Microscopy 314-307/SEM/Nova: Difference between revisions
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{| border="2" cellspacing="0" cellpadding="0" | {| border="2" cellspacing="0" cellpadding="0" | ||
!colspan="2" border="none" style="background:silver; color:black;" align="center |Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center |Equipment | ||
|style="background:WhiteSmoke; color:black" align="center"| | |style="background:WhiteSmoke; color:black" align="center"|'''"Nova"''' FEI Nova nanoSEM 600 | ||
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!style="background:silver; color:black;" align="center" width="60"| Purpose | !style="background:silver; color:black;" align="center" width="60"| Purpose | ||
|style="background:LightGrey; color:black" "rowspan="2"| | |style="background:LightGrey; color:black" "rowspan="2" align="center"| Visualisation and Microanalysis | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | * Visualisation of surfaces (topography and Z contrast) | ||
* | * Visualisation of projected image (BF STEM image) | ||
* Energy Dispersive X-ray analysis (EDS) | * Energy Dispersive X-ray analysis (EDS) | ||
*Microstructural characterisation (EBSD/TKD/STEM) | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | ||
|style="background:LightGrey; color:black" rowspan="2"|Resolution | |style="background:LightGrey; color:black" rowspan="2" align="center"|Resolution | ||
|style="background:Whitesmoke; color:black" colspan="1" align=" | |style="background:Whitesmoke; color:black" colspan="1" align="center"|The resolution of Nova depends on the sample and is in Mode II | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *High Vacuum operation in Mode II: | ||
**1.0 nm at 15 kV (TLD detector and optimum working distance) | |||
**1.8 nm at 1 kV (TLD detector and optimum working distance) | |||
*Low Vacuum operation in Mode II: | |||
**1.5 nm at 10 kV (Helix detector and optimum working distance) | |||
**1.8 nm at 3 kV (Helix detector and optimum working distance)1 nm at 15keV for Au on C sample with the TLD detector | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="7"|Instrument specifics | !style="background:silver; color:black" align="center" valign="center" rowspan="7"|Instrument specifics | ||
|style="background:LightGrey; color:black"|Detectors | |style="background:LightGrey; color:black" align="center"|Detectors | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* ETD- Everhart-Thornley for secondary electrons | * ETD- Everhart-Thornley for secondary electrons | ||
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* CCD camera | * CCD camera | ||
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|style="background:LightGrey; color:black"|Electron source | |style="background:LightGrey; color:black" align="center"|Electron source | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Field Emission - Tungsten filament | * Field Emission - Tungsten filament | ||
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|style="background:LightGrey; color:black"|Stage | |style="background:LightGrey; color:black" align="center"|Stage | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* X, Y: | * X, Y: 75 × 75 mm (piezo) | ||
* T: 0 to | * Z 10mm (DC motor) | ||
* R: 360<sup>o</sup> | * T: 0 to 70<sup>o</sup> (DC motor) | ||
* R: 360<sup>o</sup> (piezo) | |||
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|style="background:LightGrey; color:black"|Peltier stage | |style="background:LightGrey; color:black" align="center"|Peltier stage | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* FEI Peltier stage -10<sup>o</sup> to 22<sup>o</sup> | * FEI Peltier stage -10<sup>o</sup> to 22<sup>o</sup> | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black" align="center"|EBSD/TKD | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | * Bruker eFlash | ||
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|style="background:LightGrey; color:black"|EDS | |style="background:LightGrey; color:black" align="center"|EDS | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | * Bruker 50 mm<sup>2</sup> silicon drift detector, MnKα resolution at 124 eV | ||
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|style="background:LightGrey; color:black"|Operating pressures | |style="background:LightGrey; color:black" align="center"|Operating pressures | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* High vacuum (10<sup>-4</sup> Pa), Low vacuum | * High vacuum (10<sup>-4</sup> Pa), Low vacuum mode (up to 130Pa) | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Sample sizes | |style="background:LightGrey; color:black" align="center"|Sample sizes | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* No actual limit (limitted by stage movment and detector position). | * No actual limit (limitted by stage movment and detector position). | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black" align="center"|Allowed materials | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Conductors, Semiconductors,Insulators,Wet Samples, Biological (not pathogents!) | * Conductors, Semiconductors,Insulators,Wet Samples, Biological (not pathogents!) | ||
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=Characterization Techniques= | =Characterization Techniques= | ||