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Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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==Distribution Chamber (Genmark robot)==
==Distribution Chamber (Genmark robot)==


The load-lock and process chambers PC1 and PC3 are all connected thorough the common distribution chamber. The robot arm can trasfer the sample to the selected distanation. During normal operation, the chamber is pumped to a base pressure enuring the safe transfer of the sample between chambers and loadlock without breaking vacuum.
The load-lock and process chambers PC1 and PC3 are all connected through the common distribution chamber. The robot arm can transfer the sample to the selected destination. During normal operation, the chamber is pumped to a base pressure ensuring the safe transfer of the sample between chambers and load-lock without breaking a vacuum.




<gallery caption="Deposition rates of HfO2 at different temperaturs. ALD window." widths="800px" heights="300px" perrow="2">
<gallery caption="Distribution chamber (Robot). View from the service area." widths="800px" heights="300px" perrow="2">
image:arm_robot_distribution_chamber.png| The photography of the distribution chamber with and without the top cover.
image:arm_robot_distribution_chamber.png| The photography of the distribution chamber with and without the top cover.
</gallery>
</gallery>
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