Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
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==Sputtering of Aluminium== | ==Sputtering of Aluminium== | ||
Aluminium may be sputter deposited in either Wordentec or the | Aluminium may be sputter deposited in either the Wordentec, the [[Specific Process Knowledge/Thin film deposition/Lesker|Sputter-system (Lesker)]] or the [[Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Process_information | ||
|Cluster-based sputter system]]. | |||
*[[/Sputter rates for Al|Sputtering of Aluminium in Wordentec]] | *[[/Sputter rates for Al|Sputtering of Aluminium in the Wordentec]] | ||
==E-beam evaporation of Aluminium== | ==E-beam evaporation of Aluminium== | ||