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Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions

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Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,768 edits
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|-  
|-  
|Deposition rate
|Deposition rate
|2 Å/s
|1 Å/s
|5 Å/s
|5 Å/s
|-
|-
|Thickness
|Thickness
|200 nm  
|150 nm  
|200 nm
|150 nm
|-  
|-  
|Pressure
|Pressure
Line 133: Line 133:
|-
|-
|Deposition rate deviation
|Deposition rate deviation
|± 1 Å/s after stabilizing
|± 50 % after stabilizing
|-
|-
|Measured average thickness
|Measured average thickness
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