Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
| Line 113: | Line 113: | ||
|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*1 small sample | *1 small sample, down to 10x10 mm<sup>2</sup> | ||
*1 50 mm wafer | *1 50 mm wafer | ||
*1 100 mm wafer | *1 100 mm wafer | ||
*1 150 mm wafer | *1 150 mm wafer | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*1 small sample | *1 small sample, down to 10x10 mm<sup>2</sup> | ||
*1 50 mm wafer | *1 50 mm wafer | ||
*1 100 mm wafer | *1 100 mm wafer | ||