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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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[[Image:Heidelberg_MLA100.jpg|300x300px|thumb|Aligner: Maskless 01 positioned in E-4]]
[[Image:Heidelberg_MLA100.jpg|300x300px|thumb|Aligner: Maskless 01 positioned in E-4]]


The MLA 100 Maskless Aligner located in the E-5 cleanroom is a direct exposure lithography tool.  
The MLA 100 Maskless Aligner located in the E-4 cleanroom is a direct exposure lithography tool.  
It is a UV LED exposure system, that exposes the patterns directly on photosensitive resists on chips, 2, 4, and 6 inch substrates, without prior fabrication of the mask.  
It is a UV LED exposure system, that exposes the patterns directly on photosensitive resists on chips, 2, 4, and 6 inch substrates, without prior fabrication of the mask.  
The system offers top side alignment with high accuracy.
The system offers top side alignment with high accuracy.
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