Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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**Low: 1.5mm x 2mm (3mm x 2mm full field) | **Low: 1.5mm x 2mm (3mm x 2mm full field) | ||
**High: 450µm x 650µm (950µm x 650µm full field) | **High: 450µm x 650µm (950µm x 650µm full field) | ||
=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||
{| border="2" cellspacing="0" cellpadding="2" | {| border="2" cellspacing="0" cellpadding="2" | ||