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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Line 191: Line 191:
|-
|-
|Nominal intensity
|Nominal intensity
|8 mW/cm2
|8 mW/cm<sup>2</sup>
|-
|-
|Intensity deviation from nominal
|Intensity deviation from nominal
|<5%
|≤5%
|-
|-
|Intensity non-uniformity
|Intensity non-uniformity
|<2%
|≤2%
|-
|-
|}
|}
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