Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions

Revision as of 17:02, 16 March 2020 view source Reet (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 1,760 edits →Roughness of thermally evaporated aluminium ← Older edit		Revision as of 17:10, 16 March 2020 view source Reet (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 1,760 edits →Roughness of thermally evaporated aluminium Newer edit →
Line 270:		Line 270:
	==Roughness of thermally evaporated aluminium==		==Roughness of thermally evaporated aluminium==

	A study by AFM was performed to examine Al films deposited with thermal evaporation in the Wordentec. See details [[/Roughness of thermally evaporated aluminium~~\|here]]. [[/Comparison of roughness and other surface characteristics for different methods of Aluminium deposition~~\|here]].		A study by AFM was performed to examine Al films deposited with thermal evaporation in the Wordentec. See details [[/Roughness of thermally evaporated aluminium\|here]].