Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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 *[[Specific Process Knowledge/Lithography/UVExposure_Dose|Information on UV exposure dose]]
+===Quality Control (QC)===
+'''THIS SECTION IS UNDER CONSTRUCTION''' [[Image:section under construction.jpg|70px]]
+{| border="1" cellspacing="2" cellpadding="2" colspan="3"
+|bgcolor="#98FB98" |'''Quality Control (QC) for Spin coater: Süss Stepper - BARC DUV42S-6 [[Image:section under construction.jpg|70px]] '''
+|-
+|
+*[http://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper]<br>
+*[http://labmanager.dtu.dk/view_binary.php?fileId=4212 The newest QC data for Spin coater: Süss Stepper]
+{| {{table}}
+| align="center" |
+{| border="1" cellspacing="1" cellpadding="2"  align="center" style="width:400px"
+! QC Recipe:
+! (1201) DCH 150mm BARC 65nm
+|-
+|Substrate size
+|6"
+|-
+|Resist volume
+|3 ml
+|-
+|Spin-off speed
+|4700 rpm
+|-
+|Spin-off time
+|30 s
+|-
+|Soft bake temperature
+|175°C, contact
+|-
+|Soft bake time
+|60 s
+|-
+|}
+| align="center" valign="top"|
+{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px"
+!QC limits
+!Spin coater: Süss Stepper - BARC DUV42S-6
+|-
+|Nominal film thickness
+|65 nm
+|-
+|Film thickness deviation from nominal
+|<15%
+|-
+|Film thickness non-uniformity
+|<5%
+|-
+|}
+|-
+|}
+Spin-off speed will be adjusted if film thickness is outside the limit.
+|}
 === Equipment performance and process related parameters ===