Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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Lift-off is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP. | Lift-off is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP. | ||
For information on processing of AZ nLOF, see here: [[media:Process_Flow_AZ_nLOF_2020.docx|Process_Flow_AZ_nLOF_2020.docx]] | For information on processing of AZ nLOF, see here: [[media:Process_Flow_AZ_nLOF_2020.docx|Process_Flow_AZ_nLOF_2020.docx]]. | ||
For information on image reversal of AZ 5214E, see here: [[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev.docx]] | For information on image reversal of AZ 5214E, see here: [[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev.docx]]. | ||
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