Revision as of 11:32, 26 February 2020

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Name of equipment

Write a short description of the equipment(s).

Image(s) of the equipment(s)

The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:

Hot Embosser in LabManager

Process information

Link to process pages - e.g. one page for each material

Example:

Equipment performance and process related parameters

Equipment		Equipment 1
Purpose		Hot Embossing Chip Bonding
Performance	Press Plates Temperature	Upper Plate max temperature 285 degrees Celsius Lower Plate max temperature 285 degrees Celsius
Performance	Press Plates Pressure	Max pressure allowed 300 kN
Process parameter range	Temperature	0-285 degrees Celsius
Process parameter range	Pressure	1.5-300 kN
Substrates	Batch size	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers
	Allowed materials	Allowed material 1 Allowed material 2

@@ Line 46: / Line 46: @@
 |style="background:LightGrey; color:black"|Press Plates Pressure
 |style="background:WhiteSmoke; color:black"|
-*Max pressure allowed 250 bar
+*Max pressure allowed 300 kN
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
-|style="background:LightGrey; color:black"|Parameter 1
+|style="background:LightGrey; color:black"|Temperature
 |style="background:WhiteSmoke; color:black"|
-*Range
+*0-285 degrees Celsius
 |-
-|style="background:LightGrey; color:black"|Parameter 2
+|style="background:LightGrey; color:black"|Pressure
 |style="background:WhiteSmoke; color:black"|
-*Range
+*1.5-300 kN
 |-