Specific Process Knowledge/Characterization/XRD

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XRD at Nanolab

We have two XRD setups in building 346:

• The Rigaku SmartLab primarily for thin film analysis
• The XRD Powder setup primarily for analysis of bulk materials and powders

XRD SmartLab

The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm.

The XRD SmartLab located in cleanroom F-2

The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:

XRD SmartLab in LabManager

Process information

Software for analysis

The software packages used for data analysis are available on the equipment computer, but we recommend that you install it on your personal computer. To run the software you need a USB dongle with a license on, these can be borrowed from Rebecca and Kristian in room 347-077. We only have 9 dongles available, so when you are done please return the dongle to Nanolab.

The software can be found on "CleanroomDrive\_Equipment\XRD\Rigaku software\RILauncher", it should be possible to install the software without a dongle. To use the software you have to log in. The user is: Administrator. There is no password.

Equipment performance and process related parameters

Equipment		XRD SmartLab	XRD Powder
Purpose	Crystal structure analysis and thin film thickness measurement	Phase ID Crystal Size Crystallinity Quality and degree of orientation 3D orientation Latice strain Composition Twist 3D lattice constant Thickness Roughness Density	Phase ID Crystal Size Crystallinity
X-ray generator	Maximum rated output	3 kW	600 W
	Rated tube voltage	20 to 45 kV	40 kV
	Rated tube current	2 to 60 mA	15 mA
	Type	Sealed tube	Sealed tube
	Target	Cu	Cu
	Focus size	0.4 mm x 8 mm (Line/Point)	0.4 mm x 12 mm (Line)
Goniometer	Scanning mode	incident / receiver coupled or independent	incident / receiver coupled
	Goniomenter radius	300 mm	145 mm
	Minimum step size	0.0001° (0.36")	0.001° (3.6")
	Sample stage	χ:-5~+95° φ:0~360° Z:-4~+1 mm X,Y:±50 mm for a 100 mm wafer Rx,Ry:-5~+5°	Fixed with rotation
	Sample size	Diameter: 150 mm Thickness: 0~21 mm	Powders
Optics	Incident side	Cross Beam Optics(CBO) Ge(220)x2 monochromator In-Plane Parallel Slit Collimator (PSC) Soller slit Variable divergence slit	0.04° soller slit Ni and Cu filter Divergence slits Beam mask
	Receiver side	Automatic variable scattering slit Automatic variable receiver slit Parallel slit analysers (PSA) Ge(220)x2 analyser	0.04° soller slit Ni filter
Substrates	Substrate size	up to 150 mm wafers	Only for powders
	Allowed materials	All materials	All materials have to be approved