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Specific Process Knowledge/Lithography/Development: Difference between revisions

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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|Developer: 6inch]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|SU8-Developer]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|SU8-Developer]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer: E-beam Manual|Developer: E-beam Manual]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer: E-beam Manual|Developer: E-beam Manual]]</b>
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!style="background:silver; color:black" align="center" width="60"|Purpose  
!style="background:silver; color:black" align="center" width="60"|Purpose  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black" align="center"|
 
Development of
 
*AZ 5214E
*AZ 4562
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
Development of
Development of
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!style="background:silver; color:black" align="center" width="60"|Developer  
!style="background:silver; color:black" align="center" width="60"|Developer  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black" align="center"|
AZ 351B diluted 1:5 in water


(NaOH and sodium borate salt)
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
mr-Dev 600
mr-Dev 600
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Method
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Method
|style="background:LightGrey; color:black"|Development
|style="background:LightGrey; color:black"|Development
|style="background:WhiteSmoke; color:black" align="center"|
 
Submersion
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
Submersion
Submersion
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|-
|-
|style="background:LightGrey; color:black"|Handling
|style="background:LightGrey; color:black"|Handling
|style="background:WhiteSmoke; color:black" align="center"|
 
Cassette
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
Single wafer holder
Single wafer holder
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters
|style="background:LightGrey; color:black"|Temperature
|style="background:LightGrey; color:black"|Temperature
|style="background:WhiteSmoke; color:black" align="center"|
 
22°C
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
Room temperature
Room temperature
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|-
|-
|style="background:LightGrey; color:black"|Agitation
|style="background:LightGrey; color:black"|Agitation
|style="background:WhiteSmoke; color:black" align="center"|
 
Circulation and mechanical
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
Magnetic stirrer
Magnetic stirrer
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|-
|-
|style="background:LightGrey; color:black"|Rinse
|style="background:LightGrey; color:black"|Rinse
|style="background:WhiteSmoke; color:black" align="center"|
 
DI water
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
IPA
IPA
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black" align="center"|
 
* 100 mm wafers
* 150 mm wafers
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
* 100 mm wafers
* 100 mm wafers
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|-
|style="background:LightGrey; color:black"|Allowed materials
|style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black" align="center"|
Silicon, glass, and polymer substrates


Film or pattern of all types
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
Silicon and glass substrates
Silicon and glass substrates
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|-
|-
|style="background:LightGrey; color:black"|Batch
|style="background:LightGrey; color:black"|Batch
|style="background:WhiteSmoke; color:black" align="center"|
 
1-25
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
1-6
1-6
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Development"