Specific Process Knowledge/Characterization/Optical characterization: Difference between revisions
No edit summary |
No edit summary |
||
| Line 133: | Line 133: | ||
<br clear="all" /> | <br clear="all" /> | ||
==Filmtek 4000== | |||
[[image:Filmtek.JPG|275x275px|right|thumb|FilmTek 4000: positioned in cleanroom C-1]] | |||
FilmTek 4000 is a computerized film thickness measurement and material characterization system. This system combines fiber-optic spectrophotometry with advanced material modeling software to provide an affordable and reliable tool for the simultaneous measurement of film thickness, index of refraction, and extinction coefficient | |||
Normal incidence and polarized 70 degree reflection data is collected and used to calculate thickness and index of refraction of the measured film using SCI’s patented Differential Power Spectral Density (DPSD) technique. Absolute reflection data is obtained by comparing sample data to the measured reflection of a known reference sample, typically a silicon wafer with a thermally grown thin oxide (~63 nm) film. | |||
The spectrophotometer scans the sample over a predefined range of wavelengths. The software generates a reflection spectrum based on a previously stored reference scan, and then performs a regression on the unknown parameters to fit the simulated reflection and power spectral density to the observed values. The resulting thin film parameters along with the measured and modeled spectra are then displayed for the user to examine. | |||
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=169 FilmTek in LabManager] | |||
<br clear="all" /> | |||
===An overview of the performance of the FilmTek=== | |||
{| border="2" cellspacing="0" cellpadding="10" | |||
|- | |||
!style="background:silver; color:black;" align="left"|Purpose | |||
|style="background:LightGrey; color:black"|Film thickness measurements and optical characterization of optically transparent thin films||style="background:WhiteSmoke; color:black"| | |||
*Measurement of (multi layer) film thickness (only one unknown layer) | |||
*Optical constants | |||
*Surface roughness | |||
|- | |||
!style="background:silver; color:black" align="left"|Performance | |||
|style="background:LightGrey; color:black"|Thin film materials that can be measured||style="background:WhiteSmoke; color:black"| | |||
Any film that is transparent to the light in the given wavelength range | |||
ex: | |||
*Silicon Oxide | |||
*Silicon nitride | |||
*PolySilicon | |||
*Photoresists | |||
*SU8 | |||
*Other polymers | |||
*Very thin layers of metals (<20 nm) | |||
*and many more | |||
|- | |||
|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Film thickness range | |||
|style="background:WhiteSmoke; color:black"| | |||
*<100 Å to 250 µm (depending of the material) | |||
|- | |||
!style="background:silver; color:black" align="left"|Process parameter range | |||
|style="background:LightGrey; color:black"|Wavelength range | |||
|style="background:WhiteSmoke; color:black"| | |||
*400-1000 nm | |||
|- | |||
!style="background:silver; color:black" align="left"|Substrates | |||
|style="background:LightGrey; color:black"|Batch size | |||
|style="background:WhiteSmoke; color:black"| | |||
*One sample at a time - all sample larger than 5x5 mm<sup>2</sup>sizes up to 6" | |||
|- | |||
|style="background:silver; color:black"| | |||
| style="background:LightGrey; color:black"|Substrate material allowed | |||
|style="background:WhiteSmoke; color:black"| | |||
*In principle all materials | |||
*Only pure silicon, silicon oxides, silicon nitrides and quartz may be in direct contact with the surface of the stage. If you have metals, III-V materials or polymers on the back side of the substrate the please mount your sample on a silicon carrier wafer. | |||
|- | |||
|} | |||
<br clear="all" /> | |||
<!-- | |||
==Prism Coupler== | |||
[[image:Prism_coupler.jpg|300x300px|right|thumb|Prism coupler: (old image), now positioned cleanroom D-3]] | |||
The Prism coupler is a Metricon model 2010 Prism Coupler. It is an old system from 1991 but the system with a few modifications is still beening manufactured today. It is still a very easy and relaible method of determining thickness and refractive index. | |||
The prism coupler uses an optical waveguide technique to determine the thickness and refractive index of a thin film. To learn more about the theory of measurement please see the homepage of [http://www.metricon.com Metricon] | |||
It is especially good for making fast accurate measurements of dielectric thin films with n<2.02 and a thickness range of 1 µm to about 15 µm. | |||
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=12 Prism Coupler in LabManager] | |||
<br clear="all" /> | |||
===An overview of the performance of the Prism Coupler=== | |||
{| border="2" cellspacing="0" cellpadding="10" | |||
|- | |||
!style="background:silver; color:black;" align="left"|Purpose | |||
|style="background:LightGrey; color:black"|Film thickness measurements and optical characterization of optically transparent thin films||style="background:WhiteSmoke; color:black"| | |||
*Measurement of film thickness | |||
*Optical constants | |||
|- | |||
!style="background:silver; color:black" align="left"|Performance | |||
|style="background:LightGrey; color:black"|Thin film materials that can be measured||style="background:WhiteSmoke; color:black"| | |||
Film with a refractive index of less than 2.02 and that are transparent to the light in the given wavelength range | |||
ex: | |||
*Silicon Oxide | |||
*Silicon nitride | |||
*polymers | |||
|- | |||
|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Film thickness range | |||
|style="background:WhiteSmoke; color:black"| | |||
*~1µm to 15 µm | |||
|- | |||
|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Film thickness accuracy | |||
|style="background:WhiteSmoke; color:black"| | |||
*±(0.5%+50Å) | |||
|- | |||
|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Index accuracy | |||
|style="background:WhiteSmoke; color:black"| | |||
*±0.001 | |||
|- | |||
!style="background:silver; color:black" align="left"|Process parameter range | |||
|style="background:LightGrey; color:black"|Wavelength range | |||
|style="background:WhiteSmoke; color:black"| | |||
Can operate at two different wavelength: | |||
*633 nm | |||
*1550 nm (not working) | |||
|- | |||
!style="background:silver; color:black" align="left"|Substrates | |||
|style="background:LightGrey; color:black"|Batch size | |||
|style="background:WhiteSmoke; color:black"| | |||
*One sample at a time - all sample larger than 5x5 mm<sup>2</sup>sizes up to 6" | |||
|- | |||
|style="background:silver; color:black"| | |||
| style="background:LightGrey; color:black"|Substrate material allowed | |||
|style="background:WhiteSmoke; color:black"| | |||
*In principle all materials | |||
|- | |||
|} | |||
--> | |||
==Filmtek 4000== | ==Filmtek 4000== | ||