Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions
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== Rules for storage and RCA cleaning of wafers to the B2 and E4 furnaces == | == Rules for storage and RCA cleaning of wafers to the B2 and E4 furnaces == | ||
*[[Specific_Process_Knowledge/Thermal_Process/Storage_and_cleaning_of_wafer_to_the_A,_B,_C_and_E_stack_furnaces|Storage and cleaning of wafer to the B2 and E4 furnaces]] | *[[Specific_Process_Knowledge/Thermal_Process/Storage_and_cleaning_of_wafer_to_the_A,_B,_C_and_E_stack_furnaces|Storage and cleaning of wafer to the B2 and E4 furnaces]] | ||