Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Difference between revisions

From LabAdviser
Yg (talk | contribs)
New page: The furnace A4 phosphorus predep can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.
 
Yg (talk | contribs)
No edit summary
Line 1: Line 1:
The furnace A4 phosphorus predep can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.
The furnace A4 phosphorus predep(N-predep) can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.

Revision as of 10:54, 26 January 2009

The furnace A4 phosphorus predep(N-predep) can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.