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The Phosphorus Predep furnace (A4) can be used for phosphorus predeposition of silicon wafers, resulting in N-type doping. In the furnace, the silicon wafers are positioned vertically in a quarts boat.
The Phosphorus Predep furnace (A4) can be used for phosphorus pre-deposition of silicon wafers, resulting in n-type doping. In the furnace, the silicon wafers are positioned vertically in a quarts boat.




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