Specific Process Knowledge/Etch/RIE (Reactive Ion Etch): Difference between revisions
No edit summary |
|||
| Line 4: | Line 4: | ||
=<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned </span> = | =<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned </span> = | ||
* <span style="color:#FF0000"> This information is save because it might be valuable as inspiration for other dry etch systems. | |||
== Etching using the dry etch technique RIE (Reactive Ion Etch) == | == Etching using the dry etch technique RIE (Reactive Ion Etch) == | ||
<!-- | <!-- | ||