Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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 *[[Specific Process Knowledge/Lithography/UVExposure_Dose|Information on UV exposure dose]]
+====Alignment====
+*TSA microscope standard objectives: 5X, and 10X (20X available)
+*TSA microscope special objectives: 11.25X offset (for smaller separation)
+*Minimum distance between TSA microscope objectives: 33 mm (8 mm for special objectives)
+*Maximum distance between TSA microscope objectives: 160 mm
+*TSA microscope travel range: X +/- 25mm; Y +20mm / -75mm (towards flat)
+*Minimum distance between BSA microscope objectives: 15 mm
+*Maximum distance between BSA microscope objectives: 100 mm
+*BSA microscope travel range: X +50mm / -16mm; Y +50mm / -20mm (towards flat)
+*BSA chuck view ranges:
+**2": X +/-  8-22mm; Y +/- 0-6mm
+**4": X +/- 14-46mm; Y +/- 0-10mm
+**6": X +/- 14-69mm; Y +/- 0-10mm
+'''Field of view of the alignment microscopes:'''
+*TSA 5X:
+*TSA 10X:
+*TSA special:
+*BSA low:
+*BSA high:
 === Equipment performance and process related parameters ===