Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
| Line 388: | Line 388: | ||
Special features: | Special features: | ||
*High resolution (Write Mode I, including | *High resolution (Write Mode I, including Optical Autofocus) | ||
* | *Backside Alignment | ||
*Basic Gray Scale Exposure | *Basic Gray Scale Exposure | ||
*Advanced Field Alignment Mode for alignment to individual chips/devices on the substrate | *Advanced Field Alignment Mode for alignment to individual chips/devices on the substrate | ||