Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*350W Hg lamp | *350W Hg lamp | ||
*i-line filter (365nm notch filter), intensity in Constant Intensity mode: | *i-line filter (365nm notch filter), intensity in Constant Intensity mode: 8mW/cm<sup>2</sup> @ 365nm | ||
*303nm filter optional | *303nm filter optional | ||
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*500W Hg-Xe lamp | *500W Hg-Xe lamp | ||
*i-line filter (365nm notch filter), intensity in Constant Intensity mode: | *i-line filter (365nm notch filter), intensity in Constant Intensity mode: 11mW/cm<sup>2</sup> @ 365nm | ||
*UV350 optics optional | *UV350 optics optional | ||
*UV250 optics optional | *UV250 optics optional | ||