Specific Process Knowledge/Lithography/Development: Difference between revisions
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|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|Developer: 6inch]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|Developer: 6inch]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|SU8-Developer]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|SU8-Developer]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer:_TMAH_Manual|Developer: TMAH Manual]]</b> | |||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer:_TMAH_Manual|Developer: TMAH Manual]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer:_TMAH_Manual|Developer: TMAH Manual]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|Developer: TMAH UV-lithography]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|Developer: TMAH UV-lithography]]</b> | ||
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Development of | Development of | ||
*SU-8 | *SU-8 | ||
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Development of | |||
*CSAR | |||
*Zep520A | |||
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Development of | Development of | ||
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(PGMEA) | (PGMEA) | ||
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N-50 | |||
AR600-546 | |||
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AZ 726 MIF | AZ 726 MIF | ||
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Submersion | Submersion | ||
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Spray/Puddle | |||
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Spray/Puddle | Spray/Puddle | ||
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Single wafer holder | Single wafer holder | ||
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Vacuum chuck for 2",4" and 6" (the same) or chip "basket" | |||
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Edge handling chuck or chip "basket" | Edge handling chuck or chip "basket" | ||
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22°C | 22°C | ||
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Room temperature | |||
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Room temperature | Room temperature | ||
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Magnetic stirrer | Magnetic stirrer | ||
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Rotation | |||
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Rotation | Rotation | ||
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DI water | DI water | ||
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IPA | |||
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IPA | IPA | ||
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* 100 mm wafers | * 100 mm wafers | ||
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* Chips (5mm to 2") | |||
* 50 mm wafers | |||
* 100 mm wafers | |||
* 150 mm wafers | |||
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* Chips (5mm to 2") | * Chips (5mm to 2") | ||
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Film or pattern of all but Type IV | Film or pattern of all but Type IV | ||
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All cleanroom approved materials | |||
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All cleanroom approved materials | All cleanroom approved materials | ||
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1-6 | 1-6 | ||
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1 | |||
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1 | 1 | ||