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Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/AFM Icon Acceptance: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
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!style="background:silver; color:black;" align="left"|Position
!style="background:silver; color:black;" align="left"|Chucks
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Inside the cleanroom
*A symmetric chuck that handles up to 210mm wafers and 15mm thick
*An asymmetric chuck that handles up to ~4" wafer (but not small pieces) - using this a whole 4" can be accessed without rotating the sample.
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
In the basement of building 346
*A symmetric chuck that handles up to 210mm wafers and 15mm thick
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!style="background:silver; color:black;" align="left"|Purpose
!style="background:silver; color:black;" align="left"|Holders
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Surface roughness measurement
*Magnetic sample holder + magnetic discs + double sided tape
*Step/structure hight measurement
*Holder for vertical profile scans
*Surface image
*Surface potential
*Modulus
*Adhesion
*Deformation
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Surface roughness measurement
*Magnetic sample holder + magnetic discs + double sided tape
*Step/structure hight measurement
*Holder for vertical profile scans ?
*Surface image


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