Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions
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|style="background:LightGrey; color:black"|Deposition rate | |style="background:LightGrey; color:black"|Deposition rate | ||
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* | *1 Å/s (Al), 5 Å/s (Ag) | ||
*In general, 0.5-10 Å/s is possible but we need to develop a process for other rates. | |||
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!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Process parameter range | !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Process parameter range | ||
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'''*''' ''For thicknesses above | '''*''' ''For thicknesses above 200 nm, please request permission.'' | ||