Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
| Line 436: | Line 436: | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
* | * maximum writing area: 125x125 mm<sup>2</sup> | ||
* 150 mm wafer | * 150 mm wafer | ||
* 100 mm wafer | * 100 mm wafer | ||