Specific Process Knowledge/Thin film deposition: Difference between revisions
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*[[/Wordentec|Wordentec]] - ''E-beam evaporator, sputter and thermal evaporator'' | *[[/Wordentec|Wordentec]] - ''E-beam evaporator, sputter and thermal evaporator'' | ||
*[[/thermalevaporator|Thermal evaporator]] - ''Thermal evaporator'' | *[[/thermalevaporator|Thermal evaporator]] - ''Thermal evaporator'' | ||
*[[/Temescal|E Beam Evaporator (Temescal)]] | |||
*[[/Physimeca|Physimeca]] - ''E-beam evaporator (III-V lab)'' | *[[/Physimeca|Physimeca]] - ''E-beam evaporator (III-V lab)'' | ||
*[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] - ''Sputter deposition of high quality optical layers and milling/etching'' | *[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] - ''Sputter deposition of high quality optical layers and milling/etching'' | ||