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Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Line 55: Line 55:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*SF<sub>6</sub>: 0-600 sccm
*SF<sub>6</sub>: 0-600 sccm
*O<sub>2</sub>: 0-100 sccm
*O<sub>2</sub>: 0-99 sccm
*C<sub>4</sub>F<sub>8</sub>: 0-300 sccm
*C<sub>4</sub>F<sub>8</sub>: 0-300 sccm
*Ar: 0-100 sccm
*Ar: 0-100 sccm
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