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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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Lgpe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701
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Lgpe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701
353 edits
Line 120: Line 120:
*All cleanroom materials except III-V materials, copper and steel substrates, and type IV films
*All cleanroom materials except III-V materials, copper and steel substrates, and type IV films
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Silicon
*All cleanroom materials
*Glass
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*All cleanroom materials
*All cleanroom materials
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