Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions
| Line 94: | Line 94: | ||
*Annealing of the oxide | *Annealing of the oxide | ||
*Boron pre-depostion using source wafer | *Boron pre-depostion using source wafer | ||
|style="background:WhiteSmoke; color:black"|Oxidation: | |style="background:WhiteSmoke; color:black"| | ||
*Dry | Annealing: | ||
*Using N<sub>2</sub> | |||
Oxidation: | |||
*Dry oxidation using O<sub>2</sub> | |||
*Wet oxidation using H<sub>2</sub>O generated by a torch | |||
|- | |- | ||
!style="background:silver; color:black" align="center"|Performance | !style="background:silver; color:black" align="center"|Performance | ||