Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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The MLA 100 Maskless Aligner located in the E-5 cleanroom is direct write lithography tool. | The MLA 100 Maskless Aligner located in the E-5 cleanroom is direct write lithography tool. | ||
It is UV exposure system, that exposes the patterns directly on photosensitive resists on chips, 2, 4, and 6 inch substrates, without prior fabrication of the mask. | It is UV LED exposure system, that exposes the patterns directly on photosensitive resists on chips, 2, 4, and 6 inch substrates, without prior fabrication of the mask. | ||
The system offers an alignment option with high accuracy. | The system offers an alignment option with high accuracy. | ||