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| '''The user manual, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=71 LabManager]''' | | '''The user manual, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=71 LabManager]''' |
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| == Process information ==
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| Lift-off wet bench 07 is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, cross linked AZ nLOF is not.
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| For information on image reversal of AZ 5214E, see here: [[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev.docx]]
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| <br clear="all" />
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| [[Image:Lift_off.jpg|300x300px|thumb|Lift-off in D-3]]
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| '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/LiftOff#Lift-off_(4,_6) click here]'''
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| '''The user manual, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=255 LabManager]'''
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| == Process information == | | == Process information == |
