Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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=Lift-off | =Lift-off= | ||
[[Image:Lift-off 4&6.JPG|300x300px|thumb|Lift-off (4", 6") in D-3]] | [[Image:Lift-off 4&6.JPG|300x300px|thumb|Lift-off (4", 6") in D-3]] | ||
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== Process information == | == Process information == | ||
Lift-off | Lift-off is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP. | ||
For information on processing of AZ nLOF, see here: [[media:Process_Flow_AZ_nLOF_2020.docx|Process_Flow_AZ_nLOF_2020.docx]] | For information on processing of AZ nLOF, see here: [[media:Process_Flow_AZ_nLOF_2020.docx|Process_Flow_AZ_nLOF_2020.docx]] | ||
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