Specific Process Knowledge/Thin film deposition/ALD2 (PEALD): Difference between revisions

Revision as of 10:41, 10 February 2017 view source Tanamp (talk \| contribs) DCH-Employees-701 307 edits →Process information ← Older edit		Revision as of 14:03, 3 March 2017 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits →Process information Newer edit →
Line 59:		Line 59:

	*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AlN deposition using ALD2\| Al<sub>2</sub>O<sub>3</sub> deposition using '''ALD 2 (PEALD)''']]		*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AlN deposition using ALD2\| Al<sub>2</sub>O<sub>3</sub> deposition using '''ALD 2 (PEALD)''']]

			*[[/AlN deposition using ALD2\| Al<sub>2</sub>O<sub>3</sub> deposition using '''ALD 2 (PEALD)''']]