Specific Process Knowledge/Thin film deposition/ALD2 (PEALD): Difference between revisions
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*Silicon oxide, silicon nitride | *Silicon oxide, silicon nitride | ||
*Quartz/fused silica | *Quartz/fused silica | ||
*Metals - Use a dedicated carrier wafer | *Metals - Use a dedicated carrier wafer | ||
*III-V materials - Use a dedicated carrier wafer | *III-V materials - Use a dedicated carrier wafer | ||