Specific Process Knowledge/Thin film deposition: Difference between revisions
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*[[/Black Magic PECVD|Black Magic PECVD]] - ''Black Magic PECVD (Carbon)'' | *[[/Black Magic PECVD|Black Magic PECVD]] - ''Black Magic PECVD (Carbon)'' | ||
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*[[/ALD Picosun R200|ALD Picosun R200]] - Atomic | *[[/ALD Picosun R200|ALD Picosun R200]] - Atomic Layer Deposition | ||
*[[/ALD2 (PEALD)|ALD (PEALD)]] - | *[[/ALD2 (PEALD)|ALD (PEALD)]] - Plasma Enhance Atomic Layer Deposition | ||
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See the [[Specific Process Knowledge/Lithography/Coaters |Lithography/Coaters]] page for coating polymers | See the [[Specific Process Knowledge/Lithography/Coaters |Lithography/Coaters]] page for coating polymers |
Revision as of 14:20, 6 February 2017
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Choose material to deposit
Dielectrica | Semicondutors | Metals | Alloys | Transparent conductive oxides | Polymers |
Silicon Nitride - and oxynitride |
Aluminium |
TiW alloy (10%/90% by weight) |
ITO (Tin doped Indium Oxide) |
SU-8 |
Choose deposition equipment
PVD | LPCVD | PECVD | ALD | Coaters | Others
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See the Lithography/Coaters page for coating polymers |
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