Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions

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 '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=85 LPCVD TEOS furnace]'''
 ==Process Knowledge==
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 [[Specific Process Knowledge/Thin film deposition/Deposition of TEOS/Deposition of TEOS using LPCVD|Deposition of TEOS using LPCVD]]
 ==Overview of the performance of the LPCVD TEOS furnace and some process related parameters==
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 |style="background:LightGrey; color:black"|Process Temperature
 |style="background:WhiteSmoke; color:black"|
-*725 <sup>o</sup>C
+*712-720 <sup>o</sup>C
 |-
 |style="background:LightGrey; color:black"|Process pressure
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 |style="background:WhiteSmoke; color:black"|
 *TEOS: 50 sccm
-*O<math>_2</math>: 30 sccm
+*O<sub>2</sub>: 0 sccm
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates